Zirconium disilicide has the characteristics of high melting point, high hardness, and excellent thermal conductivity. It usually exists in the form of gray powder, insoluble in water, but soluble in hydrochloric acid and hydrofluoric acid. As a ceramic material, zirconium disilicate has a wide range of applications in manufacturing fine ceramic raw materials, crucibles for semiconductor film production, refractory materials, ceramics, and enamel. In addition, it can also be used to manufacture grinding and grinding beads, shading materials, and other silicified chemicals.
purity: ≥ 99.9%
Particle size: D50=10-60um
CAS: 12039-90-6
Chemical Name: Zirconium Disilicide
Chemical Formula: ZrSi₂
CAS Number: 12039-90-6
Purity: 99.5%, 99.9% available
Particle Size: 1–5 µm, 5–10 µm, 325 mesh, nano-scale (customizable)
Appearance: Gray-black powder
Production Method: Solid-state reaction / mechanical alloying
Packaging: Vacuum-sealed in anti-static bags or argon-purged containers
| Technical Advantage | Buyer Value |
High Oxidation Resistance | Stable up to 1500 °C, ZrSi₂ forms a passive SiO₂ layer ideal for high-temp environments. |
Good Electrical Conductivity | Suitable for heating elements, resistive films, and semiconductor-related materials. |
Thermal Shock Tolerance | Compatible with rapid temperature cycling—critical for aerospace, industrial kilns, and turbine components. |
Excellent Chemical Compatibility | Works well with SiC, Al₂O₃, and ZrB₂ matrices in composite ceramics. |
Zirconium disilicide is a critical material in industries that require robust thermal, chemical, and mechanical performance:
Thermal Barrier & Oxidation-Resistant Coatings
Applied via plasma spray, CVD, or sintering to protect components exposed to aggressive environments.
Advanced Ceramic Composites
Serves as a reinforcing agent in ultra-high-temperature ceramics (UHTCs) used in hypersonic vehicles and aerospace structures.
Electrothermal Devices
ZrSi₂’s metallic conductivity and thermal stability make it ideal for resistive heating elements.
PVD Target Raw Material
Utilized in the fabrication of custom ZrSi₂ sputtering targets for thin film deposition in electronics.
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