Tantalum disilicide powder, as a high-performance chemical material, is widely used in multiple fields due to its high melting point, low electrical resistivity, corrosion resistance, and high-temperature oxidation resistance. Tantalum disilicide has a dark gray cubic crystalline powder morphology, high density, and controllable particle size. Tantalum disilicate powder plays a crucial role in the fields of electric heating components, high-temperature structural components, connection circuits of integrated circuits, high-temperature oxidation resistant coatings, and ceramic matrix composites. In addition, it also holds an important position in high-tech fields such as aerospace and engine manufacturing. Due to its excellent performance and wide range of applications, tantalum disilicide powder has become one of the popular materials in material science research and industrial production today.
purity:>99.9%
Particle size: D50=1-3um
CAS: 12039-79-1
Chemical Name: Tantalum Disilicide
Molecular Formula: TaSi₂
CAS Number: 12039-79-1
Purity: ≥99.5% or ≥99.9%
Particle Size Options:<5 µm, <10 µm, 325 mesh, or custom nanometer grades
Appearance: Gray to dark gray powder
Production Method: Controlled hydrogen reduction / solid-state reaction
Packaging: Vacuum-sealed aluminum foil bags or inert gas-filled containers
| Key Feature | Customer Benefit |
Superior Oxidation Resistance | TaSi₂ forms a protective SiO₂ scale in oxidative environments up to 1650 °C—ideal for structural and thermal barrier coatings. |
High Electrical Conductivity | Suitable for electronic interconnects, heating elements, and thin-film resistors. |
Phase Stability & Thermal Shock Resistance | Excellent for aggressive high-temp processing conditions like CVD, sintering, or composite reinforcement. |
Custom Particle Control | Optimized morphology and surface area for slurry stability, coating uniformity, and controlled sintering behavior. |
Tantalum disilicide is a go-to choice for applications where traditional ceramics fail under thermal, chemical, or mechanical stress:
High-Temperature Coating Systems
Used in oxidation-resistant coatings for turbine blades, furnace components, and engine parts.
Electronic Materials
Integrated into conductive pastes, gate electrodes, and resistive thin-film elements.
Composite & Cermet Materials
Reinforcement in SiC- or ZrB₂-based ultra-high temperature ceramics (UHTCs).
Sputtering Targets & PVD Feedstocks
Raw material for producing TaSi₂ sputtering targets for barrier layers and protective films in microelectronics.
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