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Xi'an Zhiyue Material Tech. Co., Ltd.
Xi'an Zhiyue Material Tech. Co., Ltd.

High Purity Thulium Sputtering Target (Tm)

Thulium sputtering target is a silver-white sputtering target made of high-purity thulium metal. It is ductile, soft and can be cut by knife, melting point 1545°C, boiling point 1947°C, density 9.3208 g/cm³ (20°C). Thulium is stable in air, soluble in acid, and can act slowly with water; thulium oxide is light green crystal. The content of thulium in the earth's crust is two hundred thousandths of a percent, and it is one of the rare earth elements with low content, mainly found in yttrium phosphorite and black rare gold ore. It is widely used in electronics, petrochemical, metallurgy, machinery, energy, light industry, environmental protection, agriculture and other fields.



Purity: 99.95%

CAS: 7440-30-4

  • thulium sputtering target
  • thulium sputtering target

Application of High Purity Thulium Sputtering Target (Tm)

1

Thin film deposition using thulium sputtering targets

2

Thulium lasers require less cooling, work well at high temperatures, and are used in satellites

3

Thulium is used in alloys together with other rare earth metals

4

Thulium is used for doping yttrium aluminum garnet (YAG) used in lasers

5

Thulium is used for euro banknotes because it has blue fluorescence under ultraviolet light, which helps to combat counterfeiters

Product Overview

  • Product Name: Thulium Sputtering Target

  • Chemical Symbol: Tm

  • CAS Number: 7440-30-4

  • Purity Options: 99.9%, 99.99% (3N, 4N)

  • Form: Planar, disc, rectangular, or custom shape

  • Size Availability: 1”, 2”, 3”, 4” diameter and custom dimensions

  • Bonding Service: Optional indium bonding to Cu, Mo, or SS backing plates

  • Density: ≥98% of theoretical (HIP or vacuum hot-pressed)

  • Packaging: Vacuum-sealed with inert gas protection (argon or nitrogen), cleanroom-ready



Key Advantages of Zhiyue’s Thulium Sputtering Target

FeatureTechnical Benefit

Ultra-High Purity (Up to 4N)

Minimizes contamination in optical and electronic thin films.

Uniform Density & Grain Structure

Ensures stable sputtering rate and smooth film morphology.

Custom Machining & Bonding

Compatible with most RF and DC magnetron systems.

Expert Quality Control

Every batch tested for homogeneity, density, and surface finish.

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