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MBE precursor Molecular Beam Epitaxy (MBE) is a sophisticated thin-film deposition technique used to grow ultra-thin layers of materials with high precision. It operates under ultra-high vacuum conditions, which al... More+
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Nitride Powder U15-U16 filtration efficiency grade media is normally used in very high air quality requirement environment. Our nanofiber media and PTFE membrane are often used in those conditions. More+
Sulfide Sputtering Target Sulfide target material can provide excellent electrical and optical properties in coating. They are commonly used to prepare key components such as the light absorption layer and electron transport l... More+
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Tin Sulfide (II) Target (SnS) Tin sulfide (II) is a compound of tin and sulfur. The chemical formula is SnS. Its natural origin involves a rare mineral, Hertzenberg（ α- SnS). More+
Zinc Oxide Target (ZnO) Zinc oxide, an inorganic compound with the chemical formula ZnO, is an oxide of zinc, insoluble in water and ethanol, soluble in acid, aqueous sodium hydroxide solution and ammonium chloride. Zinc oxi... More+
High Purity Tin Sputtering Target (Sn) Tin is a chemical element with the symbol Sn (from Latin: stannum) and an atomic number of 50. tin is a silver-colored metal with a yellowish hue. Tin is as soft as indium and can be cut without much ... More+
High Purity Dysprosium Sputtering Target (Dy) Dysprosium sputtering targets are silver-colored metal targets composed of high-purity dysprosium metal. It has a melting point of 1420°C, a boiling point of 2840°C, and a density of 8.55 g/cm3. It ... More+
Choose the Appropriate Aluminum Sputtering Target That Meets Your Needs Aluminum sputtering targets are essential materials used in the process of thin film deposition, commonly found in industries such as electronics, aerospace, and energy. When choosing an aluminum sput... More+
Cerium Gadolinium Alloy Sputtering Target (CeGd) Purity: 99.95% More+
Erbium Metal (Er) Erbium, represented by the symbol Er and having an atomic number of 68, is a silver-white solid metal that is artificially separated, with natural erbium consistently found in chemical combination wit... More+

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Related Sputtering Target Material and Inorganic Material

High Purity Terbium Sputtering Target (Tb)

High Purity Terbium Sputtering Target (Tb)

Tantalum Nitride Powder (TaN)

Tantalum Nitride Powder (TaN)

Tantalum Oxide Granules (Ta2O5)

Tantalum Oxide Granules (Ta2O5)

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