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Tantalum Granules (Ta) Metal tantalum films have a wide range of applications in multiple fields. In the semiconductor manufacturing process, tantalum film can be used as a substrate material to protect the wafer from conta... More+
ALD Precursor Atomic Layer Deposition (ALD) is a thin-film deposition technique used in nanofabrication. It involves the sequential introduction of gaseous precursors into a reaction chamber, where they react on a ... More+
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Silicide Powder Silicide powder consists of finely milled particles composed of metal silicides, such as titanium silicide or nickel silicide. Known for their excellent conductivity and resistance to extreme temperat... More+
Boride Sputtering Target Boride targets have excellent oxidation resistance and corrosion resistance in coatings, so they are commonly used to prepare coatings in high-temperature environments. Boride coating also has good el... More+
Tin Sulfide Target (SnS2) Tin sulfide is a compound with the chemical formula SnS. The compound crystallizes in a cadmium iodide matrix, with Sn located in "octahedral holes" defined by six sulfide centers.Purity: 99... More+
Zirconium Oxide Target (ZrO2) Zirconium dioxide (ZrO2), sometimes called zirconium oxide (not to be confused with zircon), is a white crystalline form of zirconium oxide. Its most naturally occurring form with a monoclinic crystal... More+
High Purity Cobalt Sputtering Target (Co) Cobalt is a silvery-white ferromagnetic metal with a silvery-white, slightly pale pink surface, located in the fourth period of the periodic table, VIII, atomic number 27, hexagonal crystals, covalent... More+
High Purity Terbium Sputtering Target (Tb) Terbium sputtering targets are made from terbium metal. It is a silvery-white rare earth metal that is ductile, tough and flexible enough to be cut with a knife. It is relatively stable in air. Densit... More+
How Do We Fix a Damaged Sputtering Target? Sputtering targets are essential components in the process of thin film deposition, commonly used in industries such as electronics, automotive, and manufacturing. These targets are made of various ma... More+
Ytterbium Antimonide Cobalt Alloy Sputtering Target (YbCoSb) Purity: 99.9% More+

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Related Sputtering Target Material and Inorganic Material

Titanium Disilicide Powder (TiSi2)

Titanium Disilicide Powder (TiSi2)

Ytterbium Oxide Granules (Yb2O3)

Ytterbium Oxide Granules (Yb2O3)

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