Molybdenum Niobium Alloy Sputtering Target (MoNb)
Purity: 99.95%
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Zirconia Powder (ZrO2)
Zirconia is a white powder or crystalline solid with a high melting point and excellent chemical stability. It exhibits excellent mechanical properties, including high hardness and toughness. Zirconia...
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Gadolinium Oxide Granules (Gd2O3)
Firstly, gadolinium oxide coating has excellent thermal and chemical stability, which enables it to maintain stable performance in harsh environments such as high temperature, high humidity, and stron...
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Application and Preparation of Europium Sputtering Target
What is a Europium Sputtering Target?A Europium sputtering target is a sputtering target composed of high-purity metallic europium, typically shaped as a planar target, although custom shapes can be m...
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Titanium Oxide Target (TiO2)
Titanium Dioxide (chemical formula: TiO 2), white solid or amphoteric oxide powder, molecular weight: 79.9, is a white pigment with non-toxicity, optimal whiteness and brightness, opacity, and is cons...
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High Purity Hafnium Sputtering Target (Hf)
Hafnium is a chemical element with the symbol Hf and atomic number 72. Hafnium is a lustrous, silvery-gray, tetravalent transition metal chemically similar to zirconium and is found in many zirconium ...
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Molybdenum Tantalum Alloy Sputtering Target (MoTa)
Purity: 99.95%
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Lithium Oxide Powder (Li2O)
Lithium oxide is a white solid with a low density and a relatively high melting point. It is highly reactive with water and acids, forming lithium hydroxide and corresponding lithium salts. This oxide...
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Ytterbium Oxide Granules (Yb2O3)
The function of ytterbium oxide coating is mainly reflected in multiple aspects. Firstly, it can significantly improve the wear resistance, corrosion resistance, and aesthetics of the material surface...
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The Importance of Gan Sputtering Target in Semiconductor Technology
Semiconductor materials are a type of electronic material with semiconductor properties (conductivity between that of conductors and insulators, with resistivity in the range of 1mΩ·cm to 1GΩ·cm),...
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Hafnium Oxide Target (HfO2)
Hafnium oxide is an inorganic compound with the molecular formula HfO2.This colorless solid, also known as hafnium, is one of the most common and stable hafnium compounds. It is an electrical insulato...
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High Purity Tantalum Sputtering Target (Ta)
Tantalum is a chemical element with the symbol Ta and atomic number 73. Tantalum is a rare, hard, blue-gray, lustrous transition metal that is extremely corrosion-resistant.Purity: 99.95%CAS: 7440-25-...
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