High purity tantalum (Ta) metal is a critical material widely used in advanced electronics, semiconductor fabrication, and thin film coating industries. Known for its exceptional corrosion resistance, ultra-high melting point (~3017°C), and stable electrical properties, tantalum serves as a reliable sputtering target material for high-performance thin film materials and precision coating applications.
(t-Butylimido)tris(ethylmethylamino)tantalum(V)
Molecular Formula:C13H33N4Ta
PURITY:(99.99%-Ta) PURATREM TBTEMT
CAS:511292-99-2
Outstanding Corrosion Resistance in Harsh Environments
Tantalum is highly resistant to acids and chemical corrosion, making it ideal for chemical processing and coating material applications.
Excellent Performance in Semiconductor Thin Film Applications
Widely used as a sputtering target material, tantalum ensures stable thin film deposition in integrated circuits and microelectronics.
High Melting Point for Extreme Temperature Applications
With excellent thermal stability, tantalum performs reliably in high-temperature processing and vacuum environments.
Superior Electrical and Barrier Properties
Tantalum is commonly used as a diffusion barrier layer in semiconductor devices, improving device reliability and lifespan.
Flexible Supply Forms and Custom Processing
Available as tantalum metal, rods, sheets, and sputtering targets, suitable for various industrial coating supplies and fabrication needs.
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