Europium (Eu) sputtering target is a sputtering target composed of high purity europium metal. It has a melting point of 822°C and a density of 5.24 g/cm3 , mainly used for phosphorescence. It is easily oxidized and we usually oil-seal the product to prevent oxidation. In order to ensure the europium target is delivered safely to our customers, we will use cushioning material and outer box or crate to pack the target.
Purity: 99.95%
CAS: 7440-53-1
For thin film deposition; Nuclear control applications; Phosphor activator; The red phosphor in a color television tube; Laser materials and other fields.
Material: Europium (Eu)
CAS Number: 7440-53-1
Purity Grades: 99.9%, 99.99% (3N, 4N)
Form Options: Planar (circular, rectangular), rotary, bonded target
Standard Diameters: 1”, 2”, 3”, 4”, 6” (custom sizes on request)
Bonding Services: Available with backing plates (Mo, Cu, SS)
Density: ≥99% of theoretical (hot-pressed or HIP processed)
Packaging: Vacuum-sealed with inert gas protection, cleanroom-ready
| Feature | Value to Buyers |
Ultra-High Purity (up to 99.99%) | Minimizes contamination and ensures film consistency in photonic and optoelectronic systems. |
Excellent Density & Microstructure | Enables uniform sputter rate, low arcing, and high deposition stability. |
Strong Backing Plate Bonding | Enhances thermal management and prolongs target life in high-power sputtering systems. |
Custom Shape & Thickness Support | Optimized for compatibility with magnetron, RF, and ion beam sputtering tools. |
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E-mail: export@zhiyueltd.com
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RM.1624. Block A. Ming Feng Bo Ma Dou, Cross of Ming Guang Road and Shang Xin Road, Xi'an Economic and Technological Development Zone, Shaanxi Province, China